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Methyl Fluoride (CH3F) is an environmentally friendly dry etching gas with low GWP, showing very high performance in etching process of semiconductor and electronic products.
Chemical Name | Methyl Fluoride |
Synonyms | HFC-41 |
CAS # | 593-53-3 |
ELINCS # (EU) | 209-796-6 |
Molecular Formula | CH3F |
Structure | CH3-F |
Molecular Weight | 34.03 |
ODP(CFC-11 = 1) | 0 |
GWP100(CO2 = 1) | 116 |
Life Time (Days) | 2.8 |
Chemical Name | Methyl Fluoride |
Boiling Point(℃) | -78.4 |
Melting Point(℃) | -142 |
Liquid Density(@20℃) | 0.61 |
Gas Density (Air=1) | 1.2 |
Vapor Pressure(@20℃,bar) | 33 |
Critical Temperature(℃) | 44.5 |
Purity | 99.9% | 99.99% |
Cylinder Size | Valve Type | Filling Weight |
7L | CGA 350 / DISS 724 | 3kg |
16L | CGA 350 / DISS 724 | 7kg |
44L | CGA 350 / DISS 724 | 18kg |
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