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Hexafluoro-1,3-butadiene (C4F6) is an environmentally friendly dry etching gas with low GWP, high etching rate, high selectivity and high aspect ratio, showing very high performance for critical plasma etching in semiconductor devices manufacturing.
Chemical Name | Hexafluoro-1,3-butadiene |
Synonyms | Perfluorobutadiene |
CAS # | 685-63-2 |
ELINCS # (EU) | 211-681-0 |
Molecular Formula | C4F6 |
Structure | CF2=CF-CF=CF2 |
Molecular Weight | 162.03 |
ODP(CFC-11 = 1) | 0 |
GWP100(CO2 = 1) | <1 |
Life Time (Days) | 1.1 |
Chemical Name | Hexafluoro-1,3-butadiene |
Boiling Point(℃) | 6 |
Melting Point(℃) | -130 |
Liquid Density(@20℃) | 1.44 |
Critical Temperature(℃) | 139.6 |
Critical Pressure(bar) | 31.9 |
Purity | 99.9% | 99.99% |
Packing Specification
Cylinder Size | Valve Type | Filling Weight |
10.2L | CGA 350 / DISS 724 | 10kg |
44L | CGA 350 / DISS 724 | 44kg |
47L | CGA 350 / DISS 724 | 47kg |
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