NF3

Nitrogen trifluoride, a colourless, odourless and stable gas at room temperature, is a strong oxidising agent. Nitrogen trifluoride is used in the microelectronics industry as an excellent plasma etching gas, cleaving to active fluorine ions during ion etching, these fluorine ions have excellent etching rates and selectivity (for silicon oxide and silicon) for silicon and tungsten compounds. A large number of applications.

                   

Product Description

Chemical Name Nitrogen Trifluoride
Synonyms N,N,N-Trifluoroamine; NF3;Nitrogen fluoride (NF3); nitrogenfluoride(nf3); Perfluoroammonia;Stickstoff(III)-fluorid; Stickstofftrifluorid; Trifluoroamine
CAS # 7783-54-2
ELINCS # (EU) 232-007-1
Molecular Formula NF3
Structure
Molecular Weight 71.002
Physical state Gas
Color Colorless
Odor Odorless

 

Physical & Chemical Properties

Chemical Name Nitrogen Trifluoride
Boiling Point(℃) -206.79
Melting Point(℃) -129
Liquid Density(-129℃,101.325kPa) 1540kg/m3
Gas Density (Air=1) 2.46
Vapor Pressure(@20℃) 4530kPa
Critical Temperature(℃) -39.3
Critical Pressure(kPa) 4530
Critical Density (kg/m3) 522
Solubility(@20℃) Insoluble
Flash Point(℃) Not applicable
Flammability(@21℃) Not applicable
Explosion Limit(%vol) Not applicable

 

 

Product Specification

Purity 99.9% 99.99%

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